The Construction of Coherence Microscope for Extreme Ultraviolet Mask Defect Inspection in Synchrotron Facility

in International Symposium (oral presentation paper), 國際研討會(全文口頭發表)
標題The Construction of Coherence Microscope for Extreme Ultraviolet Mask Defect Inspection in Synchrotron Facility
出版類型國際研討會(全文口頭發表)
出版年度2017
AuthorsChuang, 莊俊彥, 林育正, Chen 陳韋誠, & Lin 林章生
出版日期Dec 13 2017 12:0
會議地點Taipei
其他編號0000
中文摘要

The goal of this study is to construct a defect inspection microscope system for EUV multilayer mask, the beamline19A2 of National Synchrotron Radiation Research Center in Hsinchu was adopted as a light source. In a vacuum chamber, a set of EUV mask inspection system was designed and erected to detect defects on the mask. In addition, the coherent scattering microscopy was constructed to complete the erection and technology research and development of the EUV mask inspection system. This system will be used in the process applications by academia and industry to manufacture 22 nm node and below, thus providing detection of the fast and high-resolution mask or Line edge roughness (LER) in photoresist lithography quality.

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