Mechanism and Modeling of Ring Pattern Formation for Electron Beam Exposure on Zwitterresist | Faculty Open Information System

Mechanism and Modeling of Ring Pattern Formation for Electron Beam Exposure on Zwitterresist

in Domestic Journal (Other), 國內期刊(其他)
標題Mechanism and Modeling of Ring Pattern Formation for Electron Beam Exposure on Zwitterresist
出版類型國內期刊(其他)
出版年度2003
Authors, 陳建光
期刊Jpn. J. Appl. Phys. Vol. 42 (2003) pp. 3838–3841
出版日期2003 / 3
其他編號0000
中文摘要

The novel sensitivity curve was determined for the zwitterresist. The irradiation dose in the center could create a ring pattern due to simultaneous exhibition of the positive tone and negative tone of zwitterresist. The natural logarithm dependence of ri

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